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Author
Marinel-lo Amat, Alexandre
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Abstract
Graphene, an allotrope of carbon, is the only two-dimensional material that can be made today. Since its discovery, a great interest in graphene has been shown in the scientific and industrial fields due to its good mechanical and optical properties, excellent electrical and thermal conduction, and flexibility.
However, the short period of knowledge of this material means that the production methods are not yet optimal. Although several methods for its production have already been found, it is not yet possible to manufacture large quantities of graphene in a single process. This makes the cost due to the manufacturing time very high, which makes the material more expensive.
One of the most efficient and high-quality methods of producing graphene is chemical vapor deposition (CVD). It consists of the adsorption of methane on the surface of a copper sheet at high temperature and low pressure, which favors the separation of hydrogen from carbon as the carbon is adhered to the surface of the copper with a hexagonal structure. By controlling temperature, pressure and time, it is possible to obtain monolayer graphene.
The objective of this work is to scale the process already developed at the IQS, which consists of a CVD reactor for the production of graphene at the research level. Instead of using a quartz tube reactor and a small tube furnace, the new design consists of a PLC-automated mid-size metallic CVD reactor, in the interest of producing high-quality monolayer graphene.
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